cczVeefeIP1lqWvFe4ifGQtH1PVK0ZlIo8bzgmNn20A9n8zRijosB0tjSezL
Current position: Home >> Scientific Research >> Paper Publications

Investigation of Leakage Current Mechanisms in La2O3/SiO2/4H-SiC MOS Capacitors with Varied SiO2 Thickness

Hits:

Institution:微电子学院

Title of Paper:Investigation of Leakage Current Mechanisms in La2O3/SiO2/4H-SiC MOS Capacitors with Varied SiO2 Thickness

Journal:JOURNAL OF ELECTRONIC MATERIALS

First Author:Wang, Yucheng^Jia, Renxu^Zhao, Yanli^Li, Chengzhan^Zhang, Yuming

Document Code:SCI WOS:000385021300014

Volume:45

Issue:11

Page Number:5600-5605

ISSN:0361-5235

Translation or Not:No

Date of Publication:2016-01-01

Included Journals:SCI

Date:2018-06-08

Prev One:Comparative study of atomic-layer-deposited HfO2/Al2O3, Hf0.8Al0.2Ox and Hf0.5Al0.5Ox on N-GaAs

Next One:Comparison of HfAlO, HfO2/Al2O3, and HfO2 on n-type GaAs using atomic layer deposition