Comparative study of atomic-layer-deposited HfO2/Al2O3, Hf0.8Al0.2Ox and Hf0.5Al0.5Ox on N-GaAs
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Institution:微电子学院
Title of Paper:Comparative study of atomic-layer-deposited HfO2/Al2O3, Hf0.8Al0.2Ox and Hf0.5Al0.5Ox on N-GaAs
Journal:SUPERLATTICES AND MICROSTRUCTURES
First Author:Yu, Xinjiang^Lv, Hongliang^Zhang, Yuming^Zhang, Yimen^Qin, Zaiyang
Document Code:SCI WOS:000390630200009
Volume:99
Page Number:58-61
ISSN:0749-6036
Translation or Not:No
Date of Publication:2016-01-01
Included Journals:SCI
Date:2018-06-08