Comparison of HfAlO, HfO2/Al2O3, and HfO2 on n-type GaAs using atomic layer deposition
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Institution:微电子学院
Title of Paper:Comparison of HfAlO, HfO2/Al2O3, and HfO2 on n-type GaAs using atomic layer deposition
Journal:SUPERLATTICES AND MICROSTRUCTURES
First Author:Lu, Bin^Lv, Hongliang^Zhang, Yuming^Zhang, Yimen^Liu, Chen
Document Code:SCI WOS:000390630200008
Volume:99
Page Number:54-57
ISSN:0749-6036
Translation or Not:No
Date of Publication:2016-01-01
Included Journals:SCI
Date:2018-06-08