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Interfacial and electrical characteristics of a HfO<inf>2</inf>/n-InAlAs MOS-capacitor with different dielectric thicknesses

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Institution:微电子学院

Title of Paper:Interfacial and electrical characteristics of a HfO<inf>2</inf>/n-InAlAs MOS-capacitor with different dielectric thicknesses

Journal:Chinese Physics B

First Author:Guan, He ; Lv, Hong-Liang ; Guo, Hui ; Zhang, Yi-Men ; Zhang, Yu-Ming ; Wu, Li-Fan

Document Code:EI 20155101679778

Volume:24

Issue:12

Translation or Not:No

Date of Publication:2015-01-01

Included Journals:EI

Date:2018-06-08

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