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个人信息Personal Information
教授 博士生导师 硕士生导师
性别：男
学历：博士研究生毕业
学位：博士研究生毕业
在职信息：在岗
所在单位：先进材料与纳米科技学院
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研究领域
微电子材料与器件方面的研究，涉及铁电薄膜及其存储器、氧化物半导体器件的制备、微观结构表征、畴动力学、电学性能和可靠性等方面。
- Orientation independent growth of uniform ferroelectric Hf0.5Zr0.5O2 thin films on silicon for high-density three-dimensional memory applications:Advanced Functional Materials,2022,32(49):2209604
- Intrinsic 90° charged domain wall and its effects on ferroelectric properties:Acta Materialia,2022,232:117920-1–117920-11
- Robustly stable ferroelectric polarization states enable long-term nonvolatile storage against radiation in HfO2-based ferroelectric field-effect transistors:ACS Applied Materials and Interfaces,2022,14(45):51459–51467
- Robustly stable intermediate memory states in HfO2-based ferroelectric field-effect transistors:Journal of Materiomics,2022,8(3):685–692
- Flux-closure domains in PbTiO3/SrTiO3 multilayers mediated without tensile strain:Journal of Physical Chemistry C,2022,126(9):4630–4637
- Interface effects induced by a ZrO2 seed layer on the phase stability and orientation of HfO2 ferroelectric thin films: a first-principles study:Physical Review Applied,2021,16(4):044048-1–044048-9
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