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个人信息Personal Information
教授
性别：男
学历：博士研究生毕业
学位：博士研究生毕业
在职信息：在岗
所在单位：先进材料与纳米科技学院
办公地点：南校区G-123
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- PS–PVD制备YSZ热障涂层的CMAS腐蚀行为研究:航空制造技术,2023(17)
- PS-PVD制备YSZ热障涂层的CMAS腐蚀行为研究:航空制造技术,2023,66(17):57-63
- Hfo2-based Ferroelectric Thin Film And Memory Device Applications in the Post-moore Era: a Review:自然科学基础研究（英文）,2023,3(3):332-345
- Enhancement of Resistive Switching Performance in Hafnium Oxide (HfO:Nanomaterials,2022,13(1)
- Boosting the Strain Tolerance of Ta2o5 Stabilized Zro2 Tbcs Through Prefabricated Cracks by In-situ Reaction:Journal of Alloys And Compounds,2023,935(P2)
- Robustly Stable Intermediate Memory States in Hfo2-based Ferroelectric Field-effect Transistors:无机材料学学报（英文）,2022,8(3):685-692
- New-style Logic Operation And Neuromorphic Computing Enabled by Optoelectronic Artificial Synapses in an Mxene/y Hfo2 Ferroelectric Memristor:Acs Applied Materials And Interfaces,2024,16(24):31348-31362
- Enhancement of Resistive Switching Performance in Hafnium Oxide (HfO(2)) Devices via Sol-Gel Method Stacking Tri-Layer HfO(2)/Al-ZnO/HfO(2) Structures.:Nanomaterials (Basel, Switzerland),2022,13
- Intrinsic 90° Charged Domain Wall And Its Effects on Ferroelectric Properties:Acta Materialia,2022,232
- Fabrication And High Photoresponse Performance of a La-doped Hfo2 Thin Film-based Uv Photodiode:Physica B Condensed Matter,2024,690