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论文名称：Atomically Control of Surface Morphology in Ga2o3 Epi-layers With High Doping Activation Ratio
发表刊物：Journal of Alloys And Compounds
通讯作者：陆小力
卷号：855
期号：P1
是否译文：否
发表时间：2021-02-01
发布时间：2024-04-08
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