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Title:一种基于自对准工艺的平面应变BiCMOS集成器件及制备方法

Institution:100900

Teaching and Research Group:1114

Scope of Patent:1

First Author:胡辉勇

Application Number:201210244399.9

Number of Inventors:8

Service Invention or Not:No

Application Date:2012-07-16

Date:2018-06-01