Sub-5 Nm Al-doped Hfo2 Ferroelectric Thin Films Compatible With 3d Nand Process
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Title of Paper:Sub-5 Nm Al-doped Hfo2 Ferroelectric Thin Films Compatible With 3d Nand Process
Journal:Journal of Alloys And Compounds
Correspondence Author:周益春
Volume:1007
Translation or Not:No
Date of Publication:2024-12-01
Date:2024-12-30