gXPWkJPV1VbwKOBQkTLFJEuEBZgPN7CuI8tZooLPYH4P9xXhSUq0ObOnvisd
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一种混合晶面应变Si垂直沟道CMOS集成器件及制备方法

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Title:一种混合晶面应变Si垂直沟道CMOS集成器件及制备方法

Institution:100900

Teaching and Research Group:1114

Scope of Patent:1

First Author:张鹤鸣

Type of Patent:1

Application Number:201210244462.9

Number of Inventors:8

Service Invention or Not:No

Application Date:2012-07-16

Date:2018-06-01

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