65DG4lc5SmMbWXROdjgdrhGoOABKbtLJ1GnJgNqoV7t6gLoNfqqoYDNDxnR7
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一种基于SOI衬底的双多晶平面应变BiCMOS集成器件及制备方法

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Title:一种基于SOI衬底的双多晶平面应变BiCMOS集成器件及制备方法

Institution:101901

Teaching and Research Group:1114

Scope of Patent:1

First Author:张鹤鸣

Type of Patent:1

Application Number:201210244531.6

Number of Inventors:8

Service Invention or Not:No

Application Date:2012-07-16

Date:2018-06-01

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